Issue 10/2020 - New femtosecond laser plasmain lithography for graphene

Recently, the Chun Institute of Optics, Fine Mechanics and Physics, Dean of the Chinese Academy of Sciences, received news that researchers from the Institute and others have developed a new femtosecond laser plasma exciton lithography technology (FPL).

Using this technology, the researchers achieved the rapid preparation
of high-quality micro-nano periodic structures on the surface of 100-nanometer-thick silicon-based graphene oxide films.
The results were published in
Light: Science and Applications.

The study proved for the first time that FPL technology can achieve rapid preparation
of large-area high-quality submicron periodic structures on two-dimensional thin film materials.
Thanks to the nonlinear optical characteristics of femtosecond lasers, the FPL technology processing process is not easily affected by material surface defects, impurities and other factors, and the processing substrate is not easily limited
by the type of material.
The processed material exhibits excellent mechanical properties and can be transferred
completely using the traditional wet transfer method.
This lays the foundation
for the flexible preparation of periodic microstructures of related materials.