echemi logo
Product
  • Product
  • Supplier
  • Inquiry
    Home > Chemicals Industry > Chemical Technology > Preparation method of silicon hydride and halide

    Preparation method of silicon hydride and halide

    • Last Update: 2021-06-17
    • Source: Internet
    • Author: User
    Search more information of high quality chemicals, good prices and reliable suppliers, visit www.echemi.com

    Silicon hydride

    Since the atomic radius of Si is larger than that of C, silicon atoms are formed between them
    .


    The degree of overlap of atomic orbitals when bonding is small, and the degree of overlap when forming a π bond is even smaller.


    1.
    Preparation of Silane

    High purity SiH 4 can be obtained by reducing SiCl 4 with LiAlH 4 in the medium of ether .

    SiCl 4 +LiAlH 4 =SiH 4 +LiCl+AICl 3

    Mg 2 Si reacts with hydrochloric acid to obtain SiH 4 containing impurities such as disilane
    .

    Mg 2 Si+4HC1=SiH 4 + 2MgCl 2

    The raw material Mg 2 Si can be obtained by reducing SiO 2 with metal Mg at a high temperature
    .

    SiO 2 +4Mg=Mg 2 Si+2MgO

    2.


    The nature of alkylene

    The most typical and stable silane is SiH 4 , which is a colorless and odorless gas
    .


    SiH 4 is stable at room temperature.


    SiH 4 is unstable and decomposes when heated to 500°C (while CH 4 decomposes above 1000°C)
    .

    SiH 4 =Si+2H 2

    SiH 4 has strong reducibility and spontaneously ignites in the air
    .



    SiH 4 is easily hydrolyzed, and substantially undergoes an oxidation-reduction reaction with water, and the oxidation number of Si remains unchanged
    .

    SiH 4 +(n+2)H 2 O=SiO 2 ·nH 2 O+4H 2

    13.


    2.


    SiF 4 is a colorless gas at room temperature , SiCl 4 and SiBr 4 are colorless liquids, and Sil 4 is a white solid
    .


    The melting point and boiling point increase sequentially, and the radii of the molecules increase sequentially to increase the dispersion force between the molecules


    The HF generated by the hydrolysis reaction of SiF 4 can further react with SiF 4 to generate H 2 SiF 6
    .



    Of SiCl .


    4
    is a silicon halide the most important, the HCI can be used to prepare high-purity silicon, highly humid air encountered hydrolysis take the fog, not generated and further of SiCl .


    SiCl 4 +4H 2 O=H 4 SiO 4 +4HCl

    H 2 SiF 6 is a strong acid, which is equivalent to the acidity of H 2 SO 4
    .


    The salt formed by H 2 SiF 6 and soft base is easy to dissolve, such as PbSiF 6 ; but the salt formed with hard base with a large radius is hard to dissolve, such as K 2 SiF 6 has very low solubility
    .

    Related Links: The properties and preparation methods of elemental silicon

     

     

    This article is an English version of an article which is originally in the Chinese language on echemi.com and is provided for information purposes only. This website makes no representation or warranty of any kind, either expressed or implied, as to the accuracy, completeness ownership or reliability of the article or any translations thereof. If you have any concerns or complaints relating to the article, please send an email, providing a detailed description of the concern or complaint, to service@echemi.com. A staff member will contact you within 5 working days. Once verified, infringing content will be removed immediately.

    Contact Us

    The source of this page with content of products and services is from Internet, which doesn't represent ECHEMI's opinion. If you have any queries, please write to service@echemi.com. It will be replied within 5 days.

    Moreover, if you find any instances of plagiarism from the page, please send email to service@echemi.com with relevant evidence.