echemi logo
Product
  • Product
  • Supplier
  • Inquiry
    Home > Coatings News > Paints and Coatings Market > Russia manufactured plasma generator capable of spraying high-quality film

    Russia manufactured plasma generator capable of spraying high-quality film

    • Last Update: 2021-08-05
    • Source: Internet
    • Author: User
    Search more information of high quality chemicals, good prices and reliable suppliers, visit www.echemi.com

    According to the "Satellite" news agency, scientists from the Russian Nuclear Research University (Moscow Institute of Engineering Physics-NRNUMEPhI) stated in an article published in the "Surface and Coating Technology" magazine that they have developed a method that can be used in the steam of molten materials.
    A plasma generator that generates a strong current pulse magnetron discharge
    .
    With this new technology, the thin film needed in the high-tech field can be sprayed faster, and the high-quality level can be maintained
    .

    Magnetron sputtering is the only method to deposit building glass (with various colors) that uses energy-saving coating materials
    .
    Magnetrons can spray hard coatings that can significantly improve performance onto cutting tools, such as using titanium nitride instead of gold to coat the domes of churches
    .
    In microelectronics, this method is used for the metallization of integrated circuit boards; in optics, it can be used to produce filters; it can also be used to produce hydrophobic coatings
    .

    The plasma generator equipment developed by the scientists of the Moscow Institute of Engineering Physics consists of a plasma connector and a power supply.
    It works in a special magnetron discharge mode.
    In these modes, together with sputtering, it exerts the strong vapor effect of the molten material.
    Form paint
    .

      Alexander Dumarkin, a scientific researcher in the Plasma Physics Department of the Moscow Institute of Engineering Physics, said: "Compared with vacuum evaporation, the slow growth of thin films on parts has long been magnetron sputtering, including high-power pulsed magnetron sputtering.
    Technical problem
    .
    On the other hand, the quality of the coating obtained by vacuum evaporation is much worse than that of the magnetron
    .
    Therefore, the industrialists have always been faced with a dilemma, that is, whether the product quality of the enterprise or the output is required
    .
    In the research of pulse magnetron discharge equipment with cathode, we have successfully combined the advantages of the two technologies into one
    .
    We have learned to sputter at high speed while ensuring quality
    .

      According to scientists, the acquired equipment mode and the diagnosis results show that the high current spraying of molten targets has huge technical potential
    .
    Experts are now working on industrial samples of devices that are planned to be put into production in the future
    .

      Andrei Kaqiyev, a scientific researcher in the Plasma Physics Teaching and Research Section of the Moscow Institute of Engineering Physics, said: "The industrial samples of the equipment are the same as the modules used to produce high-quality individual coatings
    .
    Our potential customers are the production of energy-saving windows and modern energy components.
    And companies that manufacture machinery for various profiles"
    .

      In the world, the magnetron sputtering method accounts for a large part of the market for producing metal and dielectric coatings suitable for electronics, machinery, construction and other fields
    .
    This method is to coat the processed parts with a material sprayed through a special target by means of plasma
    .
    At present, magnetron sputtering coating is the most common way to produce thin films in high-tech fields
    .

      In the late 1980s, the discovery in the high-current pulsed magnetron discharge of the Moscow Institute of Engineering was a major impetus to the research in this field
    .
    In the first 10 years of the 21st century, Europe and the United States implemented high-power pulsed magnetron sputtering technology (HiPIMS) on this basis
    .
    The main research motivation and application of pulse magnetron is to obtain characteristic coatings that cannot be made with any other device and method
    .

    This article is an English version of an article which is originally in the Chinese language on echemi.com and is provided for information purposes only. This website makes no representation or warranty of any kind, either expressed or implied, as to the accuracy, completeness ownership or reliability of the article or any translations thereof. If you have any concerns or complaints relating to the article, please send an email, providing a detailed description of the concern or complaint, to service@echemi.com. A staff member will contact you within 5 working days. Once verified, infringing content will be removed immediately.

    Contact Us

    The source of this page with content of products and services is from Internet, which doesn't represent ECHEMI's opinion. If you have any queries, please write to service@echemi.com. It will be replied within 5 days.

    Moreover, if you find any instances of plagiarism from the page, please send email to service@echemi.com with relevant evidence.