What is Mitsubishi Chemical's timeline and location for industrializing ultra-high purity colloidal silica?

Mitsubishi Chemical announced it will build a new production facility at its Kitakyushu, Kyushu plant in Japan, with formal operations scheduled to begin in October 2028.

Why is ultra-high purity colloidal silica important for the semiconductor industry, and how does Mitsubishi Chemical produce it?

Colloidal silica is a critical material in semiconductor manufacturing, used in silicon wafer surface polishing agents and as a raw material for chemical mechanical polishing (CMP) slurries in wafer interconnect layers; Mitsubishi Chemical produces it using ultra-high purity tetramethoxysilane as feedstock and an integrated process that achieves extremely low impurity levels, while leveraging its proprietary technology to customize key parameters such as particle size and density to meet semiconductor manufacturers’ specific production requirements.

Mitsubishi Chemical Advances Industrialization of Ultra-High Purity Colloidal Silica

Aug 25, 2026

Mitsubishi Chemical will construct a new Kitakyushu facility to produce ultra-high purity colloidal silica by October 2028, targeting semiconductor polishing demands driven by AI and data center expansion.

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