What is Mitsubishi Chemical's new ultrahigh-purity colloidal silica used for in semiconductor manufacturing?

According to the news, the ultrahigh-purity colloidal silica is used as a raw material in polishing agents for semiconductors — specifically for surface polishing of silicon wafers and for chemical mechanical polishing (CMP) slurries applied to the interconnect layers of wafers. The process demands high material removal rates, nanoscale flatness, absence of impurities, and minimal scratching, requiring precisely tailored particle shape and physical properties.

Where and when will Mitsubishi Chemical begin commercial production of its new ultrahigh-purity colloidal silica?

Mitsubishi Chemical will establish new production facilities at its Kyushu plant in Kitakyushu City, Japan, with commercial operations scheduled to begin in October 2028.

Mitsubishi Chemical to build ultrahigh-purity colloidal silica plant in Japan

Aug 20, 2026

Mitsubishi Chemical plans to construct a new ultrahigh-purity colloidal silica production facility in Japan, commencing operations in October 2028. The project aims to meet rising semiconductor demand in AI and data centers through specialized polishing agents.

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